Date：2021/9/14 ~ 10/13
Place：Virtual Conference
Dr. Jong-Shing Bow, the Material Expert of iST is honored to be invited by IPFA(International symposium on the physical & failure analysis of integrated circuits) as one of the tutorials speaker.
Meanwhile, Dr. Ching-Chun Lin, the deputy manager of iST’s Material Analysis Engineering Department will be presenting the latest research results of “Guidelines of Plasma-FIB Delayering techniques for Advanced Process Node.”
Preview of the Tutorial Session (Dr. Jong-Shing Bow):
◎ Topic: Introduction of TEM/STEM Techniques in Analyzing Nano Materials
◎ Date: 2021/9/14-10/13 (Video on Demand)
◎ FA 4
◎ Abstract:
TEM has been widely used to analyze nano material systems, including semiconductor devices to explore microstructure down to nano meter, even atomic scale. Typical TEM/STEM techniques including EDP, BF/CDF image, HRTEM image, HAADF image, HRSTEM image, EDS, and EELS will be introduced. Some special cases resolved by these techniques and typical puzzles in EDS analyses will be discussed.
◎ An outline is listed below:
(1) Basic of TEM/STEM
(2) Applications of Electron Diffraction
(3) Applications of TEM/STEM Images
(4) Composition Analysis – EDS and EELS
(5) Summary
Preview of the Paper (Dr. Ching-Chun Lin):
◎ Topic: Guidelines of Plasma-FIB Delayering techniques for Advanced Process Node
◎ Date: 2021/9/14-10/13 (Video on Demand)
◎ B2.12 (ID 100)
◎ Abstract:
An effective guideline using plasma focus ion beam (PFIB) to conduct IC chip delayering on sub-16nm technology is proposed. Through a series of DOE (design of experiment), we successfully improve the uniformity by modifying the gas concentration. In addition, geometric effect of MultiChem and end point monitor system are also discussed to achieve a uniform and accurate delayering result, which improves the hit rate of the following nano probing measurement as well.
We look forward to your participation.
For more information, please visit the tutorials webpage of IPFA: https://ipfa-ieee.org/2021/speaker-tag/tutorial/